Internal stress in plasma polymer films prepared by cascade arc torch polymerization

Authors
Citation
Qs. Yu et Hk. Yasuda, Internal stress in plasma polymer films prepared by cascade arc torch polymerization, J POL SC PC, 37(11), 1999, pp. 1577-1587
Citations number
19
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY
ISSN journal
0887624X → ACNP
Volume
37
Issue
11
Year of publication
1999
Pages
1577 - 1587
Database
ISI
SICI code
0887-624X(19990601)37:11<1577:ISIPPF>2.0.ZU;2-K
Abstract
Thin plasma polymer films were deposited from several liquid monomers (main ly siloxane-type monomers) in a low-temperature cascade are torch (CAT) rea ctor. The effects of monomer structures and plasma parameters on internal s tress in the films were experimentally studied. By appropriately adjusting these factors, the internal stress in the film was reduced nearly two order s of magnitude from 10(9) to 10(7) dyn/cm(2). It was noted that the polymer films prepared from siloxane-type monomers showed lower internal stress th an their hydrocarbon counterpart. Fourier transform-infrared spectroscopy ( FTIR) studies indicated that a large amount of Si-O-Si structure from silox ane monomers, which are very flexible bonds, was preserved in the resultant plasma polymers. Ellipsometry results suggested that the internal stress c an be qualitatively correlated with the refractive index of the plasma poly mer film. (C) 1999 John Wiley & Sons, Inc.