The binding of monovalent electrolyte ions on alpha-alumina. II. The shearyield stress of concentrated suspensions

Citation
Sb. Johnson et al., The binding of monovalent electrolyte ions on alpha-alumina. II. The shearyield stress of concentrated suspensions, LANGMUIR, 15(8), 1999, pp. 2844-2853
Citations number
59
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
15
Issue
8
Year of publication
1999
Pages
2844 - 2853
Database
ISI
SICI code
0743-7463(19990413)15:8<2844:TBOMEI>2.0.ZU;2-T
Abstract
The shear yield stress properties of a-alumina suspensions have been invest igated as a function of pH and different monovalent electrolyte types and c oncentrations. The results have then been compared with complementary elect rokinetic studies of alpha-alumina under analogous suspension conditions. O ver the entire pH range at an electrolyte concentration of 1.0 mol dm(-3), the shear yield stress is shown to decrease in the sequence Li+ > Na+ > K> Cs+, showing that the strength of the interparticle network, decreases in the same order. In addition, use of the shear yield stress model of Scales et al. (1) indicates that the interparticle separation in the presence of these species decreases in the sequence Cs+ > K+ > Na+ > Li+. These finding s are consistent with the water "structure making-structure breaking" model of Gierst et al.(2) and Berube and de Bruyn,(3) which predicts that an ent ropic attraction will exist between ions and surfaces that promote similar ordering effects in their local aqueous environments. By contrast, almost i dentical shear yield stress versus pH results are obtained in the presence of Br-, Cl-, I-, and NO3- over the entire range of electrolyte concentratio ns investigated. The interparticle separation is similarly found to be the same in those cases. These results cannot be predicted using the water "str ucture making-structure breaking" model, and do not allow the mechanism of anion-surface association to be conclusively resolved.