Surface characterization of a biochip prototype for cell-based biosensor applications

Citation
Sa. Makohliso et al., Surface characterization of a biochip prototype for cell-based biosensor applications, LANGMUIR, 15(8), 1999, pp. 2940-2946
Citations number
24
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
15
Issue
8
Year of publication
1999
Pages
2940 - 2946
Database
ISI
SICI code
0743-7463(19990413)15:8<2940:SCOABP>2.0.ZU;2-B
Abstract
Time-of flight secondary ion mass spectrometry (ToF-SIMS) has been employed to characterize and evaluate the surface of a novel biochip prototype, con sisting of an array of gold microelectrodes on which the laminin-derived ol igopeptide CDPGYIGSR-NH2 was immobilized. The microelectrodes were isolated from each other via a thin, film of amorphous Teflon (Teflon AF). Prior to studying biochip surfaces, characterization of gold surfaces (supported on oxidized silicon wafers) incorporating the oligopeptide was carried out, t o serve as reference standards. With positive-mode ToF-SIMS, the whole pept ide could be observed, and in addition, ions that were characteristic of th e constituent amino acids of the oligopeptide could also be observed. The m icrofabrication process for biochip realization comprised several steps whi ch included the use of compounds that could potentially contaminate the res ultant surface. Therefore, it was important to: investigate the chemical co mposition of these surfaces with the highest level of sensitivity. With ToF -SIMS imaging it was possible to detect oligopeptide-related ions only on t he microelectrodes and nowhere else. Assessment of the spectral data from u ser-defined regions within the imaged areas revealed that the microelectrod e and Teflon surfaces were devoid of any process-related contamination. In some cases, ToF-SIMS revealed some defects on the biochip surface, which wo uld otherwise not be readily detectable, thereby offering some insight into areas that might require further optimization in the fabrication process.