Comparative study of the GaAs (113), (115), (001), ((1)over-bar(1)over-bar(5)over-bar), ((1)over-bar(1)over-bar(3)over-bar), and (110) surfaces by atomic force microscopy, low energy electron diffraction, and reflectance anisotropy spectroscopy
M. Pristovsek et al., Comparative study of the GaAs (113), (115), (001), ((1)over-bar(1)over-bar(5)over-bar), ((1)over-bar(1)over-bar(3)over-bar), and (110) surfaces by atomic force microscopy, low energy electron diffraction, and reflectance anisotropy spectroscopy, MICROELEC J, 30(4-5), 1999, pp. 449-453
We have performed growth and surface studies using atomic force microscopy
(AFM), reflectance anisotropy spectroscopy (RAS), and low energy electron d
iffraction (LEED) on GaAs (113), (115), (001), ((115) over bar), ((113) ove
r bar), and (110) surfaces in metal-organic vapour phase epitaxy (MOVPE). A
ll surfaces except (115), exhibited at least two different reconstructions
depending on the arsenic coverage. The (113) surface showed a growth condit
ion dependent corrugation, while the (001), ((113) over bar), and (110) sur
faces have a flat surface with monoatomic steps. The ((115) over bar), and
(115) exhibit islands. The activation energies and the reaction orders for
the transition between different reconstructions were determined for the Ga
As (110), (113), and (115) surfaces by fitting RAS transients obtained duri
ng arsenic desorption at different temperatures. In all cases we found a se
cond-order time dependence proportional to l/kt with an activation energy o
f (2.4 +/- 0.3) eV for (110), (1.50 +/- 0.02) eV for (113), and (2.09 +/- 0
.09) eV for (115) surfaces. (C) 1999 Published by Elsevier Science Ltd. All
rights reserved.