Silicon nanopillars formed by reactive ion etching using a self-organized gold mask

Authors
Ovchinnikov, V Malinin, A Novikov, S Tuovinen, C
Citation
V. Ovchinnikov et al., Silicon nanopillars formed by reactive ion etching using a self-organized gold mask, PHYS SCR, T79, 1999, pp. 263-265
Citations number
4
Categorie Soggetti
Physics
Journal title
PHYSICA SCRIPTA
ISSN journal
02811847 → ACNP
Volume
T79
Year of publication
1999
Pages
263 - 265
Database
ISI
SICI code
0281-1847(1999)T79:<263:SNFBRI>2.0.ZU;2-Q
Abstract
Silicon nanopillars were fabricated by using reactive ion etching in a fluo rinated plasma at room temperature. A self-organized gold mask consisting o f gold islands was formed by in situ heating of a thin gold him. Structures were characterized by scanning electron microscopy.