Holographic inversion of Kikuchi electron diffraction patterns for thin epitaxial NaCl films grown on GaAs(001)

Citation
P. Korecki et al., Holographic inversion of Kikuchi electron diffraction patterns for thin epitaxial NaCl films grown on GaAs(001), SURF SCI, 425(1), 1999, pp. 22-30
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
425
Issue
1
Year of publication
1999
Pages
22 - 30
Database
ISI
SICI code
0039-6028(19990409)425:1<22:HIOKED>2.0.ZU;2-I
Abstract
Normal-incidence, multiple-energy Kikuchi electron diffraction patterns (ho lograms) have been measured for clean GaAs(001) surface and for thin NaCl f ilms epitaxially grown on a GaAs(001) substrate. Three-dimensional atomic i mages of both structures have been obtained directly by the integral-energy phase-summing method. For the clean semiconductor surface, the superimpose d images of Ga and As bulk atoms were well resolved within an accuracy of 0 .5 Angstrom. A distinctly different local atomic configuration was found af ter the deposition of the epitaxial NaCl film. Possible models of the NaCl/ GaAs(001) epitaxy are discussed. A detailed analysis of the reconstructed d iffraction patterns revealed that an initial formation of the Cl-Ga bond oc curred in the system, and after deposition of 5 ML NaCl, the substrate was uniformly covered by a layer at least 3 ML thick. (C) 1999 Elsevier Science B.V. All rights reserved.