Measurement of collector-base junction avalanche multiplication effects inadvanced UHV/CVD SiGe HBT's

Citation
Gf. Niu et al., Measurement of collector-base junction avalanche multiplication effects inadvanced UHV/CVD SiGe HBT's, IEEE DEVICE, 46(5), 1999, pp. 1007-1015
Citations number
22
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
46
Issue
5
Year of publication
1999
Pages
1007 - 1015
Database
ISI
SICI code
0018-9383(199905)46:5<1007:MOCJAM>2.0.ZU;2-B
Abstract
This paper presents measurements of the avalanche multiplication factor (M - 1) in SiGe HBT's using a new technique capable of separating the avalanch e multiplication and Early effect contributions to the increase of collecto r current with collector-base bias, as well as allowing safe measurements a t practical current densities. The impact of collector doping, current dens ity, Ge profile, and operation temperature are reported for the first time using measured and simulated results from a production quality UHV/CVD Sice HBT technology. Limitations of the technique in the presence of significan t self-heating are discussed. By turning on the secondary hole impact ioniz ation, we revealed the difference in impact ionization between strained SiG e and Si in the presence of the "dead space" effect, Despite its smaller ba ndgap, the compressively strained SiGe layer shows an apparent decrease in the secondary hole impact ionization rate compared to Si.