A GeO2-SiO2 planar waveguide, activated with 1% mol Pr3+, has been prepared
using a dip-coating technique. The GeO2-SiO2 film was deposited on a subst
rate consisting of a silicon wafer with a silica buffer layer. After anneal
ing at 800 degrees C and 900 degrees C the waveguide luminescence and Raman
spectra were measured. The Raman spectra show that complete densification
is achieved after annealing at 800 degrees C. Analysis of the emission spec
tra and the decay curves from the P-3(0) and D-1(2) states of Pr3+ indicate
s that the non-radiative relaxation due to the rare-earth clustering is les
s important than in massive silica xerogels. (C) 1999 Elsevier Science B.V.
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