Surface morphology of nitrided thin thermal SiO2 studied by atomic force microscopy

In this work the surface morphology of nitrided silicon dioxide is extensiv ely studied using atomic force microscopy. Nitridation is obtained by therm al annealing in nitriding atmosphere in conventional furnace, immediately a fter thermal oxidation of silicon substrates. The characterisation performe d concerns the oxide surface, as well as the region where nitrogen is incor porated, the latter exposed using a diluted NF solution. Significant differ ences in the morphology of the nitrided layer are observed, which are a fun ction of the nitridation process applied. They allow us to correlate the mo rphology to the nitrogen incorporation mechanisms that have occurred. (C) 1 999 Elsevier Science B.V. All rights reserved.