Design principles of high-sensitivity and high-resolution electrophotographic and photothermoplastic materials

Authors
Akimov, IA Gogolev, YA Denisyuk, IY Meshkov, AM
Citation
Ia. Akimov et al., Design principles of high-sensitivity and high-resolution electrophotographic and photothermoplastic materials, J OPT TECH, 66(3), 1999, pp. 256-259
Citations number
16
Categorie Soggetti
Optics & Acoustics
Journal title
JOURNAL OF OPTICAL TECHNOLOGY
ISSN journal
10709762 → ACNP
Volume
66
Issue
3
Year of publication
1999
Pages
256 - 259
Database
ISI
SICI code
1070-9762(199903)66:3<256:DPOHAH>2.0.ZU;2-Q
Abstract
The design principles of multilayer structures for the creation of high-res olution and high-sensitivity materials operating in a sequential phototherm oplastic process are analyzed. The structure {substrate (flexible or rigid) -{conducting electrode [metal or InO(Sn) layer]}-{insulating barrier layer} -{photoconducting generation-injection layer}-{transport-thermoplastic laye r} is shown to be the most promising for the given problem. (C) 1999 The Op tical Society of America.