The design and fabrication of a micropolarizer array for imaging polarimetr
y is described for the 3-5-mu m-wavelength region. Each micropolarizer cons
ists of a 475-nm-period Mo wire grid in a 16 mu m x 16 mu m aperture. Inter
ference lithography is used to generate the small grating features through
an etch mask layer. Arrays of 256 x 256 micropolarizers at three distinct a
ngular orientations have been fabricated that permit the measurement of the
first three Stokes vector components in each pixel of an imaging polarimet
er. An imaging system composed of a micropolarizer array integrated directl
y onto a focal plane array has been assembled, and initial testing has been
performed. (C) 1999 Optical Society of America [S0740-3232(99)01905-5].