The nanolithography technique is proposed and realized experimentally using
the local field of femtosecond laser pulses enhanced in a submicron region
due to lighting rod effect or to the excitation of local resonances in an
STM tip-substrate system. Surface topography analysis in STM mode demonstra
tes the controlled surface modification in a suitable regime of intensity p
arameters and femtosecond laser pulses focusing in the STM tip region.