Surface chemical compounds of nonmetal atoms (C, Si, S) with refractory metals (W, Mo, Re, Ir)

Citation
Nr. Gall et al., Surface chemical compounds of nonmetal atoms (C, Si, S) with refractory metals (W, Mo, Re, Ir), PHYS LOW-D, 3-4, 1999, pp. 27-41
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICS OF LOW-DIMENSIONAL STRUCTURES
ISSN journal
02043467 → ACNP
Volume
3-4
Year of publication
1999
Pages
27 - 41
Database
ISI
SICI code
0204-3467(1999)3-4:<27:SCCONA>2.0.ZU;2-A
Abstract
The regularities of formation and destruction of surface chemical compounds (SCC) of nonmetal atoms (Si, S, C) and transition metal surfaces (W, Re, M o, Ir) are discussed and the values of kinetic:parameters of these-processe s are deduced. SCC are the absorption layers formed under the conditions of sufficient diffusion mobility of adatoms and having a composition strictly determined by the nature of the adsorbate and the surface of the substrate . Special emphasize is made on the importance of surface chemical compounds consideration in interpretation of diffusion experiment.