Significant improvements in the performance of microwave sources have been
achieved in recent years by the introduction of the appropriate amount of p
lasma into tubes designed to accommodate plasma. Plasma filling has been cr
edited with increasing the electron beam current, bandwidth, efficiency and
reducing or eliminating the need for guiding magnetic fields in microwave
sources. Neutralization of the e-beam space charge by a plasma enhances the
current capability and beam propagation, and the generation of hybrid wave
s in plasma-filled sources increases the electric field on axis and improve
s the coupling and efficiency. Control of the plasma density in these micro
wave sources is often required to avoid instabilities and variations in the
output power level and pulse length. Recent experimental and theoretical a
dvances in this field, and the benefits and limitations of plasma filling o
f several different types of microwave sources, will be discussed. (C) 1999
American Institute of Physics. [S1070-664X(99)91305-8].