Development of X-ray and extreme ultraviolet (EUV) optical devices for diagnostics and instrumentation for various surface applications

New methods of surface-sensitive instrumentation for the diagnostics of ext reme ultraviolet (EUV), soft x-ray (SXR) and x-ray radiation have been deve loped. In particular, these methods of instrumentation are of great importa nce for studies of the interaction of electron, ion and photon beams with m atter (atoms, molecules, ions, clusters, surfaces, micro- and submicron str uctures), Such collision studies are based on both glass capillary converte rs (GCCs) and multilayer mirrors (MLMs), gratings and crystals. The optical GCC device provides guiding, focusing and polarization analysis of short-w avelength radiation with a large bandwidth, and the MLM, grating and crysta l optical elements are used for dispersing, focusing and polarization-sensi tive studies of radiation within a more narrow bandwidth. In particular, we report here on the development of optical diagnostic devices, such as very compact EUV and SXR spectrometers, for measurements of polarization and sp ectral characteristics of short-wavelength radiation. Our high-throughput a nd high resolution compact spectrometers for the SXR range are based on gra zing incidence spectrometers, MLMs and a sliced multi-layer grating (SMG) n ovel type of dispersion element. Furthermore, we will utilize a Schwarzschi ld objective with a spatial resolution of similar to 0.1-0.3 mu m for imagi ng surfaces following ion-surface interaction. Copyright (C) 1999 John Wile y & Sons, Ltd.