Hardness enhancement of sputtered Ni3Al/Ni multilayers

Citation
S. Tixier et al., Hardness enhancement of sputtered Ni3Al/Ni multilayers, THIN SOL FI, 342(1-2), 1999, pp. 188-193
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
342
Issue
1-2
Year of publication
1999
Pages
188 - 193
Database
ISI
SICI code
0040-6090(19990326)342:1-2<188:HEOSNM>2.0.ZU;2-4
Abstract
Ni3Al/Ni multilayers have been grown by magnetron sputtering at room temper ature. Structural characterisations were performed by means of X-ray diffra ction and reflection. The indentation hardness of the samples as a function of the bilayer thickness has been studied. An increase in hardness up to 8 8% of the bulk hardness of Ni3Al is observed when bilayer thickness Lambda decreases to Lambda(max) approximate to 100 Angstrom. A further decrease in bilayer thickness results in a decrease in hardness. At Lambda > Lambda(ma x) the hardness variation is found to be compatible with the Hall-Petch rel ation. At Lambda < Lambda(max), the reduction in hardness is discussed in t erms of structure and morphology of the layers. An increase of the mosaic s pread of the grains as well as a decrease in density is observed at small L ambda. (C) 1999 Elsevier Science S.A. All rights reserved.