Micro/nanotribology of ultra-thin hard amorphous carbon coatings using atomic force friction force microscopy

Citation
S. Sundararajan et B. Bhushan, Micro/nanotribology of ultra-thin hard amorphous carbon coatings using atomic force friction force microscopy, WEAR, 229(1), 1999, pp. 678-689
Citations number
18
Categorie Soggetti
Material Science & Engineering
Journal title
WEAR
ISSN journal
00431648 → ACNP
Volume
229
Issue
1
Year of publication
1999
Pages
678 - 689
Database
ISI
SICI code
0043-1648(199904)229:1<678:MOUHAC>2.0.ZU;2-C
Abstract
Microscale scratch and wear resistance tests using an atomic force microsco pe have been conducted on ultra-thin hard amorphous carbon coatings, often called diamond-like carbon (DLC) coatings, deposited using filtered cathodi c are (FCA), direct ion beam (IB), electron cyclotron resonance plasma chem ical vapour deposition (ECR-CVD) and sputter (SP) deposition processes. Coa ting thicknesses of 20, 10, 5 nm and, for the first time, 3.5 nm coatings, have been investigated. The objectives of the study were to identify the th innest coating that exhibits good wear-resistance, to identify deposition p rocesses that produced superior coatings for wear-resistance and to underst and failure mechanisms of such ultra-thin coatings during wear. It was foun d that, in general, the thicker coatings exhibited better scratch/wear perf ormance than thinner coatings due to their better load-carrying capacity as compared to the thinner coatings. At 20 nm, ECR-CVD and FCA coatings showe d the best wear resistance. At 10 nm, ECR-CVD was the best, while IB coatin g showed the best wear resistance at 5 nm. Five nanometer coatings showed r easonable wear resistance, while 3.5 nm coatings showed extremely low load- carrying capacity, poor wear resistance and evidence of early coating delam ination. Although IB and ECR-CVD 3.5 nm coatings showed some amount of wear resistance at low loads, it appears that the 3.5 nm coatings studied are i nfeasible for wear-resistant applications as of now. (C) 1999 Published by Elsevier Science S.A. All rights reserved.