Generation of pure, high-density metal-vapor plasma by capillary discharge

Authors
Kukhlevsky, SV Ver, C Kaiser, J Kozma, L Palladino, L Reale, A Tomassetti, G Flora, F Giordano, G
Citation
Sv. Kukhlevsky et al., Generation of pure, high-density metal-vapor plasma by capillary discharge, APPL PHYS L, 74(19), 1999, pp. 2779-2781
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
19
Year of publication
1999
Pages
2779 - 2781
Database
ISI
SICI code
0003-6951(19990510)74:19<2779:GOPHMP>2.0.ZU;2-I
Abstract
Generation of pure, metal-vapor plasmas with peak densities above 10(19) cm (-3) is reported. The plasma production is based on the explosive ablation of electrode material in the capillary ms discharge. The plasma density is controlled by varying the discharge parameters. High purity and density wer e achieved by optimizing the electrode configuration, the capillary materia l, and dimensions. (C) 1999 American Institute of Physics. [S0003-6951(99)0 4619-7].