Abrupt PbTiO3/SrTiO3 superlattices grown by reactive molecular beam epitaxy

Citation
Jc. Jiang et al., Abrupt PbTiO3/SrTiO3 superlattices grown by reactive molecular beam epitaxy, APPL PHYS L, 74(19), 1999, pp. 2851-2853
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
74
Issue
19
Year of publication
1999
Pages
2851 - 2853
Database
ISI
SICI code
0003-6951(19990510)74:19<2851:APSGBR>2.0.ZU;2-2
Abstract
PbTiO3/SrTiO3 superlattices were grown on (001) SrTiO3 substrates by reacti ve molecular beam epitaxy (MBE). Sharp superlattice reflections were observ ed by x-ray diffraction. High-resolution transmission electron microscopy o f a [(PbTiO3)(10)/(SrTiO3)(10)](15) superlattice revealed that the PbTiO3/S rTiO3 interface structure is atomically sharp. The superlattice interfaces are fully coherent; no misfit dislocations or other crystal defects were ob served in the superlattice by transmission electron microscopy. Selected ar ea electron diffraction patterns indicated that the PbTiO3 layers are orien ted with the c axis parallel to the growth direction. The dimensional contr ol and interface abruptness achieved in this model system indicate that MBE is a viable method for constructing oxide multilayers on a scale where enh anced dielectric effects are expected. (C) 1999 American Institute of Physi cs. [S0003-6951(99)02919-8].