A SIMS and XPS study about ions influence on electrodeposited PbO2 films

Authors
Amadelli, R Armelao, L Tondello, E Daolio, S Fabrizio, M Pagura, C
Citation
R. Amadelli et al., A SIMS and XPS study about ions influence on electrodeposited PbO2 films, APPL SURF S, 142(1-4), 1999, pp. 200-203
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
142
Issue
1-4
Year of publication
1999
Pages
200 - 203
Database
ISI
SICI code
0169-4332(199904)142:1-4<200:ASAXSA>2.0.ZU;2-I
Abstract
XPS and SIMS investigation is presented on doped PbO2 electrodeposited on T i under conditions in which the beta form of the oxide largely prevails. Co mplementary results obtained by XPS and SIMS analyses indicate that the dop ing species markedly affect the oxygen species accumulation on the oxide su rface. In particular, metal cations added to electrodeposition bath are fou nd to influence the F- incorporation in the surface region of PbO2 even if these foreign species are not detected in the coatings, (C) 1999 Published by Elsevier Science B.V. All rights reserved.