Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection

We show that the measuring of the reflectance changes in transparent system s allows one to optically characterize the surface of films growing under t he conditions of atomic partial-monolayer deposition. In the model, a conti nuous layer with effective optical parameters describes the growth front. G rowing amorphous TiO2 thin films from TiCl4 and H2O at 115 degrees C is use d in demonstration experiments, (C) 1999 Elsevier Science B.V. All rights r eserved.