Citation
Yc. Peng et al., Enhancement of C-49 to C-54 TiSi2 phase transformation on (001)Si with an ultrathin TiN seed layer, APPL SURF S, 142(1-4), 1999, pp. 336-340
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332
→ ACNP
Volume
142
Issue
1-4
Year of publication
1999
Pages
336 - 340
Database
ISI
SICI code
0169-4332(199904)142:1-4<336:EOCTCT>2.0.ZU;2-G
Abstract
An ultrathin TiN seed layer was used to reduce the transformation temperatu
re of C-49 to C-54 TiSi2. The fine-grained structure of C-49 TiSi2 was indu
ced by the interposing TiN layer. Since C-54 TiSi2 nucleated more easily at
the grain boundaries of fine-grained C-49 structure, the phase transformat
ion temperature was reduced. (C) 1999 Elsevier Science B.V. All rights rese
rved.