Low frequency noise measurements on TiN/n-Si Schottky diodes

The deposition temperature dependence of the characteristics of TiNx/n-Si S chottky diodes fabricated via reactive magnetron sputtering, is studied thr ough the current-voltage characterization and the low frequency excess nois e measurements. As the deposition temperature was varied from room temperat ure up to 400 degrees C, both the ideality factor of the diode and the powe r spectral density of the noise current decreased. The analysis of the low frequency noise shows that the noise due to the trapping and detrapping at the interface due to the random walk of electrons via the modulation of the barrier height dominates the noise due to the mobility fluctuation, except at very low current levels, in these non-ideal diodes. It is found that th e interface states density could be reduced by almost an order of magnitude by raising the deposition temperature up to 400 degrees C from room temper ature. (C) 1999 Elsevier Science B.V. All rights reserved.