Electron drift and attachment in CHF3 and its mixtures with argon

Authors
Wang, YC Christophorou, LG Olthoff, JK Verbrugge, JK
Citation
Yc. Wang et al., Electron drift and attachment in CHF3 and its mixtures with argon, CHEM P LETT, 304(5-6), 1999, pp. 303-308
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CHEMICAL PHYSICS LETTERS
ISSN journal
00092614 → ACNP
Volume
304
Issue
5-6
Year of publication
1999
Pages
303 - 308
Database
ISI
SICI code
0009-2614(19990507)304:5-6<303:EDAAIC>2.0.ZU;2-J
Abstract
Measurements are reported of the electron drift velocity, w, in CHF3 gas an d in its mixtures with argon. The E/N dependence of w in the mixtures exhib its regions of distinct negative differential conductivity. A small electro n attachment rate constant (similar to 13 X 10(-14) cm(3) s(-1) for density -reduced electric fields, E/N < 50 X 10(-17) V cm(2)) has been measured, wh ich may be due to impurities. (C) 1999 Elsevier Science B.V. All rights res erved.