Deposition of amorphous titanium oxide films using alkoxy(pyrazolylborate)titanium(IV) compounds

CITi((OPr)-Pr-r)(3) reacts with Na[HB(R(3)R(4)R(5)pz)(3)] (where pz denotes pyrazolyl) to yield volatile isopropoxy(pyrazolylborate) titanium(Iv) comp ounds, Methoxy- and tert-butoxy(pyrazolylborate)titanium(Iv) complexes were isolated from the reaction of hydrido(trispyrazolylborate)trichlorotitante with the sodium alcoholate. Using [HB(pz)(3)Ti((OPr)-Pr-r)(3)], thin amorp hous TiO2 films were grown by metal organic chemical vapor deposition (MOCV D) in a low pressure reactor, in the temperature range 250-600 degrees C Th e dependence of the growth on evaporation rate, oxygen now and substrate te mperature is discussed. The influence of different co-reactants on texture and composition of the film, i.e., O-2, N-2, H-2, and O-2 with MeOH, was al so investigated, The films were characterized by UV-vis and IR spectroscopy , X-ray diffraction (XRD), Auger electron spectroscopy (AES), and X-ray pho toelectron spectroscopy (XPS).