A deep level transient spectroscopy study of electron irradiation induced deep levels in p-type 6H-SiC

Citation
M. Gong et al., A deep level transient spectroscopy study of electron irradiation induced deep levels in p-type 6H-SiC, J APPL PHYS, 85(10), 1999, pp. 7120-7122
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
10
Year of publication
1999
Pages
7120 - 7122
Database
ISI
SICI code
0021-8979(19990515)85:10<7120:ADLTSS>2.0.ZU;2-H
Abstract
1.7 MeV electron irradiation-induced deep levels in p-type 6H-SiC have been studied using deep level transient spectroscopy. Two deep hole traps are o bserved, which are located at E-V+0.55 eV and E-V+0.78 eV. They have been i dentified as two different defects because they have different thermal beha viors. These defects at E-V+0.55 eV and E-V+0.78 eV are annealed out at 500 -200 degrees C, respectively, and are different from the main defects E1/E2 , Z1/Z2 observed in electron irradiated n-type 6H-SiC. This indicates that new defects have been formed in p-type 6H-SiC during electron irradiation. (C) 1999 American Institute of Physics. [S0021-8979(99)05010-0].