Near-edge x-ray absorption fine structure and Raman characterization of amorphous and nanostructured carbon films

Amorphous and nanostructured carbon films were grown by using two different techniques: ion sputtering and cluster beam deposition. The films were stu died by near-edge x-ray absorption fine structure (NEXAFS) and Raman spectr oscopy. Depending on the precursors, atoms, or clusters, the films are char acterized by a different sp (2)/sp(3) ratio which influences the mechanical and the electronic properties. Due to the sensitivities of NEXAFS (local o rder) and Raman (medium-range order), we have characterized and compared th e structure of the films over different length scales. The complementarity of NEXAFS and Raman techniques for the characterization of disordered forms of carbon is here presented and discussed. We also present an original met hod of NEXAFS spectra calibration allowing a better determination of peak p ositions. (C) 1999 American Institute of Physics. [S0021-8979(99)05309-8].