Direct measurement of surface scattering in giant magnetoresistance spin valves

We present a technique to measure directly the extent of surface scattering in giant magnetoresistance (GMR) spin valves. By monitoring both resistanc e and magnetoresistance during deposition, we may quantify any discontinuou s changes in electron scattering associated with the formation of a given s urface. Our technique is applied to the case of noble metal overlayer depos ition (Ag and Cu) on NiO/Co/Cu/Co spin valves. We find no evidence to suppo rt the establishment of a specularly reflecting surface. (C) 1999 American Institute of Physics. [S0021-8979(99)04710-6].