J. Burm et al., Improvements of short-channel effects using selectively recess-etched FET (SRFET) with two gate regions, J KOR PHYS, 34, 1999, pp. S85-S87
A MODFET structure with two gate regions is suggested to improve short chan
nel effect. This type of FETs can be produced using selective gate recess-e
tches (SRFET). A PISCES simulation on two gate region MODFETs showed substa
ntial decrease in output conductance to 13.6 mS/mm from 20.8 mS/mm of FETs
with conventional single gate structure. The improvement, attributed to gra
dual electric field distribution from the gate structure of SRFETs, should
help to improve FET performances. The transconductance, I-V characteristics
, and frequency response do not show much difference between conventional s
ingle gate-region FETs and the suggested two gate-region SRFETs.