Improvements of short-channel effects using selectively recess-etched FET (SRFET) with two gate regions

Citation
J. Burm et al., Improvements of short-channel effects using selectively recess-etched FET (SRFET) with two gate regions, J KOR PHYS, 34, 1999, pp. S85-S87
Citations number
6
Categorie Soggetti
Physics
Journal title
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
ISSN journal
03744884 → ACNP
Volume
34
Year of publication
1999
Supplement
S
Pages
S85 - S87
Database
ISI
SICI code
0374-4884(199904)34:<S85:IOSEUS>2.0.ZU;2-Z
Abstract
A MODFET structure with two gate regions is suggested to improve short chan nel effect. This type of FETs can be produced using selective gate recess-e tches (SRFET). A PISCES simulation on two gate region MODFETs showed substa ntial decrease in output conductance to 13.6 mS/mm from 20.8 mS/mm of FETs with conventional single gate structure. The improvement, attributed to gra dual electric field distribution from the gate structure of SRFETs, should help to improve FET performances. The transconductance, I-V characteristics , and frequency response do not show much difference between conventional s ingle gate-region FETs and the suggested two gate-region SRFETs.