Preparation for TEM of layered samples with fragile microstructure and weak layer interface

Citation
Ak. Westman et al., Preparation for TEM of layered samples with fragile microstructure and weak layer interface, MICROSC RES, 45(3), 1999, pp. 198-202
Citations number
8
Categorie Soggetti
Multidisciplinary
Journal title
MICROSCOPY RESEARCH AND TECHNIQUE
ISSN journal
1059910X → ACNP
Volume
45
Issue
3
Year of publication
1999
Pages
198 - 202
Database
ISI
SICI code
1059-910X(19990501)45:3<198:PFTOLS>2.0.ZU;2-1
Abstract
The objective of this work was to prepare for transmission electron microsc opy (TEM) a layered structure of materials with fragile microstructure. The samples consisted of two layers of different materials, silicon nitride an d borosilicate glass, loosely bonded together. The low strength of the samp le resulted in fragmentation during more conventional preparation. However, it was possible to prepare the fragments by mounting them in a titanium sp ecimen carrier with aluminium strips as support. After grinding and polishi ng, a technique of low-angle ion milling was used to obtain electron beam t ransparent areas at the nitride/glass interface. (C) 1999 Wiley-Liss, Inc.