Using a two-dimensional Scheutjens and Fleer self-consistent field cal
culation, we determine the equilibrium morphology of thin films of sym
metric AB diblock copolymers confined between hard, smooth plates. A l
amellar phase is established with the stripes either perpendicular or
parallel to the walls. With neutral walls, the perpendicular orientati
on is stabilized by the nematic ordering of the monomers, which arises
from the orientational constraint imposed by the walls. When the subs
trates are composed of pure A monomer (thus repulsive to B), there are
transitions from strained parallel conformations, which wet the subst
rates with A polymer, to distorted perpendicular configurations as the
film thickness is varied. It is possible that the removal of one of t
he walls (the usual experimental scenario of thin films spun cast onto
a substrate) can still lead to spontaneous and robust pattern formati
on on the scale of tens of nanometers.