Martensitic transformation in thin-film (TiPd)(50)(TiNi)(50)

Citation
S. Mathews et al., Martensitic transformation in thin-film (TiPd)(50)(TiNi)(50), PHIL MAG L, 79(5), 1999, pp. 265-272
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE LETTERS
ISSN journal
09500839 → ACNP
Volume
79
Issue
5
Year of publication
1999
Pages
265 - 272
Database
ISI
SICI code
0950-0839(199905)79:5<265:MTIT(>2.0.ZU;2-C
Abstract
We have produced thin films of(TiPd)(50)(TiNi)(50) shape-memory alloy (SMA) by de magnetron sputtering at an elevated temperature. 'As-grown' films we re crystalline, requiring no post-deposition anneal. A SMA film, approximat ely 1.5 mu m thick, grown on a Si(100) cantilever, approximately 80 mu m th ick, showed a martensitic transformation near room temperature. The martens itic transformation was observed by measuring cantilever damping, cantileve r bending and X-ray diffraction (XRD) patterns, all as functions of tempera ture. The XRD patterns indicated that the film was purely austenite (B2 pha se) at high temperatures and was a mixture of austenite and martensite at l ow temperatures. Damping measurements suggest that the low-temperature mart ensite is a mixture of B19 and B19' phases. The transformation was reversib le and exhibited a temperature hysteresis of approximately 25 degrees.