Hillock growth phenomena during post-indentation annealing of quasicrystalline AlPdMn

Citation
B. Wolf et al., Hillock growth phenomena during post-indentation annealing of quasicrystalline AlPdMn, PHYS ST S-A, 172(2), 1999, pp. 317-327
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
172
Issue
2
Year of publication
1999
Pages
317 - 327
Database
ISI
SICI code
0031-8965(19990416)172:2<317:HGPDPA>2.0.ZU;2-D
Abstract
Single-quasicrystalline icosahedral AlPdMn was subject to Vickers microinde ntations at room temperature, annealed up to 750 degrees C in vacuum, and t hen inspected using optical microscopy, atomic force microscopy (AFM), wave length dispersive microanalysis (WDX) and Auger spectroscopy (AES). At temp eratures above 600 degrees C the whole sample surface became increasingly r ough, exhibiting holes and small elevations, whereas the vicinity of the im pressions remained free of surface alterations. The growth of large hillock s out of the impressions was observed at temperatures above 700 degrees C i n the presence of oxygen. No growth of high elevations was noted for an oxy gen partial pressure below 3 x 10(-6) Pa. AES and WDX revealed an enrichmen t of manganese and the depletion of aluminium in the hillocks. The results are discussed in the frame of indentation induced defects and their impact on diffusion and surface migration.