The effect of substrate temperature on the structure and hardness of magnetron sputtering deposited carbon nitride films

Authors
Zheng, WT Guo, JH Sjostrom, H Sundgren, JE
Citation
Wt. Zheng et al., The effect of substrate temperature on the structure and hardness of magnetron sputtering deposited carbon nitride films, PHYS ST S-A, 172(2), 1999, pp. 373-378
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
172
Issue
2
Year of publication
1999
Pages
373 - 378
Database
ISI
SICI code
0031-8965(19990416)172:2<373:TEOSTO>2.0.ZU;2-E
Abstract
Carbon nitride films are deposited on Si(001) substrates by reactive de mag netron sputtering graphite in a pure N-2 discharge. The structure of carbon nitride films was probed using near edge X-ray absorption fine structure ( NEXAFS) and high resolution electron microscopy (HREM), and the hardness wa s evaluated using nanoindentation experiments. Both the structure and hardn ess for the films are affected by substrate temperature (T-S). C1s NEXAFS s pectra show that the intensity of pi* resonance is the lowest for the film grown at T-S = 350 degrees C, having a turbo-stratic-like structure and hig h hardness of 60 GPa. The correlation between the structure and hardness of carbon nitride films is discussed.