PHONON-MODE HARDENING IN EPITAXIAL PBTIO3 FERROELECTRIC THIN-FILMS

Citation
L. Sun et al., PHONON-MODE HARDENING IN EPITAXIAL PBTIO3 FERROELECTRIC THIN-FILMS, Physical review. B, Condensed matter, 55(18), 1997, pp. 12218-12222
Citations number
25
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
55
Issue
18
Year of publication
1997
Pages
12218 - 12222
Database
ISI
SICI code
0163-1829(1997)55:18<12218:PHIEPF>2.0.ZU;2-J
Abstract
Using (110) NdGaO3 wafers as the lattice matched substrates, PbTiO3 th in films have been epitaxially grown by metal-organic chemical vapor d eposition under reduced pressure. Highly resolved Raman spectra of the thin films have been recorded by a grazing-angle scattering technique . The E(1TO) mode of the epitaxial film has been observed to have a 7- cm(-1) upward shift compared to the bulk PbTiO3 single crystal, which is different from the soft-mode behavior observed in PbTiO3 ultrafine powder and polycrystalline thin films. This transverse optical mode up shift phenomenon is attributable to the residual in-plane compressive stress in the epitaxial thin film caused by the film-substrate interac tion. This phonon-mode-shift phenomenon provides a method to estimate the residual stresses existing in a ferroelectric thin film.