Etch channel elimination in synthetic quartz by electrodiffusion process

The generation of channels in synthetic quartz by chemical etching is an un desirable effect for technological applications. These etch channels can be suppressed by electrodiffusion (sweeping) processing of specific ions by t he application of a high electric field at temperatures below 570 degrees C . In the present paper we report the study on the operational parameters of the electrodiffusion process for the suppression of etch channels opened b y the action of hydrofluoric acid in Z bars of synthetic quartz. The effici ency to inhibit etch channel formation was evaluated by measuring the densi ty of such channels in samples treated in HF 48% solution for 24 h.