Vitreous silica processing by Vapor Phase Deposition for optical fiber preform

Citation
Ck. Suzuki et D. Torikai, Vitreous silica processing by Vapor Phase Deposition for optical fiber preform, RADIAT EFF, 147(1-2), 1998, pp. 55-63
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
RADIATION EFFECTS AND DEFECTS IN SOLIDS
ISSN journal
10420150 → ACNP
Volume
147
Issue
1-2
Year of publication
1998
Pages
55 - 63
Database
ISI
SICI code
1042-0150(1998)147:1-2<55:VSPBVP>2.0.ZU;2-8
Abstract
With the fast development of information technologies, the demand for high performance and low cost, for example in the production of optical fiber, i s continuously increasing, specifically in the case of Brazil that depends on imported silica glass tube in the Modified Chemical Vapor Deposition pro cess. In the case of Vapor-Phase Deposition (VPD) technique, deposition eff iciency is very high with lower production cost in comparison with other pr ocesses. In the present work, we report some results on high purity vitreou s silica processing by VPD technique, such as: efficiency as high as 80% fo r a burner with circular cross-section, deposition of soot with neural-like network and randomly aggregated structure, good consolidation process by h eat treatment in electrical furnace, at temperature up to 1400 degrees C an d controlled atmosphere and observation of a layer of bubbles arrested at t he interface of two deposited spiral soot layers.