Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass

Authors
Gimkiewicz, C Hagedorn, D Jahns, J Kley, EB Thoma, F
Citation
C. Gimkiewicz et al., Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass, APPL OPTICS, 38(14), 1999, pp. 2986-2990
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
38
Issue
14
Year of publication
1999
Pages
2986 - 2990
Database
ISI
SICI code
0003-6935(19990510)38:14<2986:FOMFPO>2.0.ZU;2-E
Abstract
For an integrated free-space optical interconnection system we suggest the use of microprisms to achieve large coupling angles at low loss. Prisms wer e fabricated in photoresist and quartz glass by analog lithography. High-en ergy-beam-sensitive glass was used as the gray-tone mask. Optical testing o f the prisms shows acceptable surface quality and high efficiency (95%). (C ) 1999 Optical Society of America.