PATTERN GENERATION BY INVERSE PHASE-CONTRAST

Beam shaping is usually achieved by placing a phase mask at the input end of an optical system. The shaped beam is formed at its optical Fre snel or Fourier plane. Designing the phase mask is often a computation ally intensive task. An alternative approach is presented, exploiting the concept of phase contrast imaging. in the inverse phase contrast ( IPC) method the design of the mask is simple and direct.