Optimized technology for freely positionable Josephson junctions in Yba(2)Cu(3)O(7-x) fabricated by local ion damaging

Citation
J. Hollkott et al., Optimized technology for freely positionable Josephson junctions in Yba(2)Cu(3)O(7-x) fabricated by local ion damaging, IEEE APPL S, 9(1), 1999, pp. 39-44
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
9
Issue
1
Year of publication
1999
Pages
39 - 44
Database
ISI
SICI code
1051-8223(199903)9:1<39:OTFFPJ>2.0.ZU;2-D
Abstract
Freely positionable Josephson junctions in high-temperature superconductor thin films are fabricated by a combination of photo- and electron-beam lith ography, In selected regions of YBCO thin films point defects are induced b y oxygen implantation. These weak links exhibit resistively shunted junctio n (RSJ)-like voltage-current characteristics close to the junction transiti on-temperature. Below this temperature, a transition from RSJ to Bur-flow b ehavior is observed. Fraunhofer patterns appear in magnetic modulation meas urements at different temperatures. The temperature dependence of the criti cal current reveals superconductor/normal conductor/superconductor (SNS) fe atures, The dependence of Shapiro steps on microwave power demonstrates Jos ephson contributions over the entire temperature range.