Thermal and package performance limitations in LDMOSFET's for RFIC applications

Citation
P. Khandelwal et al., Thermal and package performance limitations in LDMOSFET's for RFIC applications, IEEE MICR T, 47(5), 1999, pp. 575-585
Citations number
20
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
ISSN journal
00189480 → ACNP
Volume
47
Issue
5
Year of publication
1999
Pages
575 - 585
Database
ISI
SICI code
0018-9480(199905)47:5<575:TAPPLI>2.0.ZU;2-O
Abstract
This paper presents a systematic study of the limitations imposed by therma l and packaging considerations on radio-frequency (RF) performance of Si bu lk and silicon-on-insulator (SOI) lateral DMOSFET's (LDMOSFET's). Several b ulk and SOI devices are studied with the help of measurements as well as tw o-dimensional device simulations incorporating electrothermal models, Model parameters are extracted and used in circuit simulators to perform RF char acterization of these devices. Further, a new three-region theory for LDMOS FET is discussed and used to evaluate the static and RF performance of the devices in nonisothermal environment. This paper shows that package plays a n important role in RF performance of SOI and bulk devices due to self-heat ing effects within the device. A detailed de and RF performance evaluation is presented. Significant drift is observed in RF performance of bulk and S OI devices due to self-heating considerations. The physical understanding o f these thermal effects within the device can facilitate design of better p ackages for bulk and SOI devices.