Investigations of ion distributions in Cl plasmas in the Applied Materials
Decoupled Plasma Source chamber have been undertaken through the use of sim
ulation. The Hybrid Plasma Equipment Model plasma simulation software was e
mployed. These simulations were performed to investigate which reactions ma
y be considered significant in the DPS tool according to the current Cl mod
el. In addition, new reactions that have been proposed internally to explai
n some experimental results were also tested to determine their significanc
e, One of the reactions that was determined to be significant is Cl+ to Cl-
2(+) charge exchange reaction which influences the ratio of Cl+ ions to Cl-
2(+) ions in the DPS chamber. This reaction may influence the ability of Al
etch processes to remove Cu residue.