Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence

Citation
Kl. Steffens et Ma. Sobolewski, Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence, IEEE PLAS S, 27(1), 1999, pp. 74-75
Citations number
3
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
27
Issue
1
Year of publication
1999
Pages
74 - 75
Database
ISI
SICI code
0093-3813(199902)27:1<74:ECOPSU>2.0.ZU;2-Z
Abstract
Planar laser-induced fluorescence was performed in the parallel-plate gaseo us electronics conference reference cell to determine two-dimensional maps of the CF2 radical in 89% CF4/11% O-2 chamber-cleaning plasmas. The spatial characteristics of the CF2 density and of broadband optical emission were controlled by varying the current at the upper electrode by adjusting the i mpedance between the upper electrode and ground. The results suggest that e lectrical control of the current paths through the plasma could be used to control the spatial distribution of reactive chemical species, aiding in th e optimization of chamber-cleaning plasmas.