Pattern-dependent charging in plasmas

Authors
Hwang, GS Giapis, KP
Citation
Gs. Hwang et Kp. Giapis, Pattern-dependent charging in plasmas, IEEE PLAS S, 27(1), 1999, pp. 102-103
Citations number
4
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
27
Issue
1
Year of publication
1999
Pages
102 - 103
Database
ISI
SICI code
0093-3813(199902)27:1<102:PCIP>2.0.ZU;2-5
Abstract
When patterned surfaces are exposed to plasmas, the directionality differen ce between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern in creases (a feature multiplicity effect).