F. Tamisier et al., Temperature dependence for the metastable phase formation in Au50Ni50 thinfilms under ion bombardment, J APPL PHYS, 85(11), 1999, pp. 7655-7663
The transformation of crystalline (111) oriented Au50Ni50 thin films produc
ed by ion beam mixing of Au/Ni multilayers was studied under krypton ion ir
radiation in the temperature range from 4 to 100 K. The volume fraction of
the amorphous phase was determined as a function of the ion fluence from in
situ resistivity measurements, while ex situ x-ray diffraction was used to
analyze the residual crystalline fraction. The experimental results indica
te that the total Kr+ fluence necessary for complete amorphization of a met
astable Au50Ni50 solid solution exponentially increases with increasing bom
bardment temperatures up to a critical value T-c of approximately 100 K, ab
ove which an ion induced amorphization is no longer possible. Furthermore,
within the amorphization regime, two different mechanisms can be distinguis
hed: A direct amorphization process via dense cascades at very low temperat
ures, while close to T-c overlapping of sequentially damaged regions is req
uired to obtain the amorphous phase. The fact that amorphization is never o
bserved under light ion irradiation even at 4 K demonstrates that the idea
of a lattice collapse by defect accumulation cannot explain the amorphizati
on behavior in this system. This points to the importance of energetic dens
e cascades for the amorphization process. Additional experiments on nanocry
stalline Au50Ni50 films suggest that the lack of structural relaxation and/
or the reduction of crystalline regrowth at amorphous/crystalline interface
s are necessary conditions for the stabilization of the amorphous clusters
formed within the cores of dense cascades. Thus, the observed kinetic behav
ior is explained by considering the balance between dynamic annealing and a
morphous phase formation. The importance of interface processes for crystal
line growth is corroborated by studying the ion induced crystallization of
an amorphous film. (C) 1999 American Institute of Physics. [S0021-8979(99)0
6911-X].