Theoretical and experimental study of charge carrier kinetics in crystalline silicon

Citation
O. Hahneiser et M. Kunst, Theoretical and experimental study of charge carrier kinetics in crystalline silicon, J APPL PHYS, 85(11), 1999, pp. 7741-7754
Citations number
36
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
85
Issue
11
Year of publication
1999
Pages
7741 - 7754
Database
ISI
SICI code
0021-8979(19990601)85:11<7741:TAESOC>2.0.ZU;2-Q
Abstract
A model simulating excess charge carrier kinetics in Si wafers was develope d taking into account space charge fields and surface recombination. This m odel was applied to experimental data obtained by contactless transient and frequency resolved photoconductivity measurements of silicon wafers with a ccumulation or depletion layers at the surface. It is shown that a surface accumulation layer has only a minor influence and surface recombination can be analyzed with a surface recombination velocity weakly depending on the excess carrier concentration. At low injection level a surface depletion la yer leads to a strongly nonlinear behavior of the photoconductivity due to excess charge carriers stored in the space charge region. The presence of t hese charge carriers is also revealed by the tail of the transient photocon ductivity signal characterized by a decay time longer than the volume lifet ime. At higher injection level the contribution of these charge carriers to the photoconductivity can be neglected and the data can be analyzed with t he (differential) surface recombination velocity. (C) 1999 American Institu te of Physics. [S0021-8979(99)02911-4].