In situ reflectance difference spectroscopy: nitrogen-plasma doping of MBEgrown ZnTe layers

Citation
D. Stifter et al., In situ reflectance difference spectroscopy: nitrogen-plasma doping of MBEgrown ZnTe layers, J CRYST GR, 202, 1999, pp. 132-136
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
132 - 136
Database
ISI
SICI code
0022-0248(199905)202:<132:ISRDSN>2.0.ZU;2-Z
Abstract
We performed in situ reflectance difference spectroscopy (RDS) during Nitro gen-doping of ZnTe thin films grown by molecular beam epitaxy (MBE): to the MBE chamber, equipped with an electron cyclotron resonance cell for N-plas ma generation, an RDS system is attached via a strainfree mounted normal in cidence viewport. At first, ZnTe (0 0 1)-surfaces have been studied under v arying exposure conditions, like Zn, Te and/or N-plasma flux onto the sampl e surface. Furthermore, RDS features in the vicinity of the E-1 and E-1 + D elta(1) transitions were used to optimize online the doping performance of the N-plasma cell by varying the sourer parameters, like N-pressure and inp ut power. In addition, ex situ BE spectra of doped layers with different ca rrier concentrations have been investigated. (C) 1999 Elsevier Science B.V. All rights reserved.