Interfacial deep-level defects as probes for ultrathin InAs insertions in GaAs

Citation
P. Krispin et al., Interfacial deep-level defects as probes for ultrathin InAs insertions in GaAs, J CRYST GR, 202, 1999, pp. 267-270
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
267 - 270
Database
ISI
SICI code
0022-0248(199905)202:<267:IDDAPF>2.0.ZU;2-4
Abstract
Due to their short-range potential, interfacial deep-level defects can be a pplied as local probes for the lateral confinement of quantum states in zer o-dimensional structures. Single, ultrathin InAs insertions in GaAs are inv estigated by deep-level transient Fourier spectroscopy and capacitance-volt age measurements. It is experimentally verified that the large number of sm all, highly strained InAs islands, which are formed near the transition fro m layer-by-layer to three-dimensional growth, results in quantum states, wh ich are laterally confined across the plane of the ultrathin InAs insertion in GaAs. (C) 1999 Elsevier Science B.V. All rights reserved.