Growth of cubic InN on InAs(001) by plasma-assisted molecular beam epitaxy

Citation
Ap. Lima et al., Growth of cubic InN on InAs(001) by plasma-assisted molecular beam epitaxy, J CRYST GR, 202, 1999, pp. 396-398
Citations number
6
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
396 - 398
Database
ISI
SICI code
0022-0248(199905)202:<396:GOCIOI>2.0.ZU;2-7
Abstract
Cubic InN lavers were grown on the top of InAs buffer films on GaBs(0 0 1) substrates by plasma-assisted molecular beam epitaxy. The growth of the c-I nN films was initiated by a nitridation of the InAs overlayers at 450 degre es C. The lattice constant of c-InN. measured by X-ray is equal to (4.98 +/ - 0.01) Angstrom, in agreement to RHEED measurements made during the growth . Transmission electron microscopy measurements detected stacking faults in the InN layers parallel to the (1 1 1) InN planes. (C) 1999 Elsevier Scien ce B.V. All rights reserved.