Peculiarities of migration-enhanced-epitaxy (MEE) versus molecular beam epitaxy (MBE) growth kinetics of CdSe fractional monolayers in ZnSe

Citation
S. Sorokin et al., Peculiarities of migration-enhanced-epitaxy (MEE) versus molecular beam epitaxy (MBE) growth kinetics of CdSe fractional monolayers in ZnSe, J CRYST GR, 202, 1999, pp. 461-464
Citations number
9
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
202
Year of publication
1999
Pages
461 - 464
Database
ISI
SICI code
0022-0248(199905)202:<461:POM(VM>2.0.ZU;2-2
Abstract
Peculiarities of migration-enhanced epitaxy of CdSe fractional monolayers i n a ZnSe matrix are studied using photoluminescence (PL) and transmission e lectron microscopy (TEM) techniques. Dependencies of Cd incorporation coeff icient on Se/Cd flux ratio as well as on the temperature are discussed. The critical Cd coverage of growth surface per cycle is established by PL to b e of 0.5 ML at 280 degrees C and depends on substrate temperature. The exce ss of Cd deposited is suggested to accumulate in CdSe-based nanoscale islan ds (similar to 30 nm in diameter) formed at sites of the growth surface imp erfections like point and extended defects, which is confirmed by plan-view TEM measurements. (C) 1999 Elsevier Science B.V. All rights reserved.